Bestec Co-Sputter Deposition System
- Ultra-high vacuum system
- 8 magnetron sources 2“ (co-deposition configuration)
- 1 magnetron source 3” (centered)
- DC and RF sputtering
- sample heater (up to 1000°C)
- high-resolution power supplies
- Ar, N2, O2
- sample rotation
- load lock with 6x magazine
- part of a PLD / MBE cluster system
Sputter deposition and ion beam etching
Sputter deposition
- 4x magnetron sources 2"
- DC and RF sputter deposition
- co-deposition with two sources
- sample rotation
- sample magazine
- oblique deposition between 0° and 90°
- Ar, N2, O2
Etching
- RF ion source
- three-grid accelerator system
- 400 eV ion beam energy (default, up to 1000 eV available)
- beam current typ. 10mA
- 25mm beam diameter
- sample rotation and inclination
Ferromagnetic Resonance (FMR)
Broadband FMR
- 0.1 to 30 GHz source (DS Instruments SG30000PRO) with 15dBm
- 80mm core magnet (up to 2T in perpendicular configuration)
- grounded coplanar waveguide design
- detection with Schottky diode
- field modulation
Spin-Torque FMR
- 0.1 to 30 GHz source (DS Instruments SG30000PRO) with 15dBm
- 50mm core magnet (up to 0.5T)
- FormFactor ACP40 GSG 150µm pitch microprobe
- Keithley 2450 sourcemeter for DC detection
- field modulation and lock-in detection of mixing voltage
Kerr microscope and wafer prober
Kerr microscope
- Zeiss Axioscope Vario
- polarizer / analyzer upgrade
- 5x and 20x Epiplan Neofluar POL lenses
- The Imaging Source industrial camera
- vector magnet system with in-plane (200mT) and out-of-plane field (100mT)
- 3D Hall sensor integrated into the sample stage
Wafer prober
- tungsten tips with 5µm radius
- compact micropositioners
- Keithley 2450 source meter for general purpose measurements
- Zurich Instruments MFLI lock-in amplifier
- Keithley DMM6500 multimeters
- Agilent 33500 waveform generator
- GMR, TMR, Hall effect, current-induced magnetization switching, etc…